Atomic layer deposition (ALD) yog cov tshuaj vapor deposition technology uas loj hlob nyias films txheej los ntawm alternately txhaj ob los yog ntau tshaj precursor molecules. ALD muaj qhov zoo ntawm kev tswj xyuas siab thiab sib xws, thiab tuaj yeem siv dav hauv cov khoom siv hluav taws xob semiconductor, cov khoom siv optoelectronic, lub zog cia khoom thiab lwm yam haujlwm. Cov hauv paus ntsiab lus ntawm ALD muaj xws li precursor adsorption, cov tshuaj tiv thaiv nto thiab tshem tawm los ntawm cov khoom, thiab cov ntaub ntawv ntau txheej tuaj yeem tsim los ntawm kev rov ua cov kauj ruam no hauv ib lub voj voog. ALD muaj cov yam ntxwv thiab qhov zoo ntawm kev tswj xyuas siab, kev sib txig sib luag, thiab cov qauv tsis ntxeem tau, thiab tuaj yeem siv rau kev tso tawm ntawm ntau yam khoom siv substrate thiab ntau yam ntaub ntawv.
ALD muaj cov yam ntxwv thiab qhov zoo hauv qab no:
1. Siab controllability:Txij li thaum ALD yog txheej txheem kev loj hlob ntawm txheej txheej, lub thickness thiab muaj pes tsawg leeg ntawm txhua txheej ntawm cov khoom tuaj yeem tswj tau meej.
2. Uniformity:ALD tuaj yeem tso cov ntaub ntawv sib npaug ntawm tag nrho cov substrate nto, zam qhov tsis sib xws uas tuaj yeem tshwm sim hauv lwm cov thev naus laus zis tso tawm.
3. Non-porous qauv:Txij li thaum ALD muab tso rau hauv ib chav tsev ntawm ib qho atoms lossis ib qho molecules, cov yeeb yaj kiab uas tau tshwm sim feem ntau muaj cov qauv ntom ntom, tsis muaj qhov ntxeem tau.
4. Kev pab them nqi zoo:ALD tuaj yeem npog cov qauv zoo sib xws, xws li nanopore arrays, cov ntaub ntawv porosity siab, thiab lwm yam.
5. Scalability:ALD tuaj yeem siv rau ntau yam khoom siv substrate, suav nrog hlau, semiconductors, iav, thiab lwm yam.
6. Versatility:Los ntawm kev xaiv cov khoom sib txawv ua ntej, ntau yam khoom sib txawv tuaj yeem tso rau hauv cov txheej txheem ALD, xws li hlau oxides, sulfides, nitrides, thiab lwm yam.
