Pyrolytic carbon txheejyog ib txheej nyias ntawmpyrolytic carbon coatednyob rau saum npoo ntawm heev purified isostaticgraphite siv tshuaj vapor deposition (CVD) technology. Nws muaj qhov ceev ceev, siab purity, thiab anisotropicthermal, hluav taws xob, sib nqus, thiab mechanical zog.
Main feature:
1. Qhov saum npoo yog ntom thiab tsis muaj pores.
2. High purity, tag nrho impurity cov ntsiab lus <20ppm,zoo airtightness.
3.Kev kub siab ua haujlwm, lub zog nce nrog kev siv qhov kub thiab txias, ncav cuag qhov siab tshaj plawsTus nqi ntawm 2750 ℃, sublimation ntawm 3600 ℃.
4.Tsawg elastic modulus, siab thermal conductivity, tsis tshua muaj thermal expansion coefficient,thiab zoo heev thermal shock kuj.
5.Zoo tshuaj stability, resistant rau acid, alkali, ntsev, thiab organic reagents, thiab muajtsis cuam tshuam rau cov hlau molten, slag, thiab lwm yam corrosive media. Nws tsis oxidizeho nyob rau hauv cov huab cua hauv qab 400 ℃, thiab oxidation tus nqi honce ntawm 800 ℃.
6. Tsis tso cov pa roj ntawm qhov kub thiab txias, nws tuaj yeem tswj tau lub tshuab nqus tsev10-7mmHg ntawm ib ncig ntawm 1800 ℃.
Khoom siv:
1. Melting crucible rau evaporation hauvKev lag luam semiconductor.
2. Lub rooj vag hluav taws xob hluav taws xob siab.
3. Txhuam uas tiv tauj lub tshuab hluav taws xob.
4. Graphite monochromator rau X-ray thiab neutron.
5. Ntau yam duab ntawm graphite substrates thiabatomic absorption tube txheej.