Lub Si Substrate los ntawm Semicera yog ib qho tseem ceeb hauv kev tsim cov khoom siv hluav taws xob ua haujlwm siab. Engineered los ntawm high-purity Silicon (Si), no substrate muaj exceptional uniformity, stability, thiab zoo heev conductivity, ua rau nws zoo tagnrho rau ib tug ntau yam ntawm advanced daim ntawv thov nyob rau hauv semiconductor kev lag luam. Txawm hais tias siv hauv Si Wafer, SiC Substrate, SOI Wafer, lossis SiN Substrate ntau lawm, Semicera Si Substrate muab cov khoom zoo sib xws thiab kev ua tau zoo tshaj plaws kom tau raws li qhov xav tau ntawm cov khoom siv hluav taws xob niaj hnub no thiab cov ntaub ntawv tshawb fawb.
Unmatched Performance nrog High Purity thiab Precision
Semicera's Si Substrate yog tsim los siv cov txheej txheem siab heev uas ua kom muaj kev huv siab thiab kev tswj kom nruj. Lub substrate ua lub hauv paus rau kev tsim ntau yam khoom siv ua haujlwm siab, suav nrog Epi-Wafers thiab AlN Wafers. Qhov tseeb thiab qhov sib xws ntawm Si Substrate ua rau nws yog qhov kev xaiv zoo tshaj plaws rau kev tsim cov txheej txheem nyias nyias epitaxial thiab lwm yam khoom siv tseem ceeb siv hauv kev tsim cov semiconductors tom ntej. Txawm hais tias koj ua haujlwm nrog Gallium Oxide (Ga2O3) lossis lwm yam khoom siv siab heev, Semicera's Si Substrate ua kom muaj kev ntseeg siab thiab ua haujlwm siab tshaj plaws.
Kev siv hauv Semiconductor Manufacturing
Hauv kev lag luam semiconductor, Si Substrate los ntawm Semicera yog siv dav hauv cov ntawv thov, suav nrog Si Wafer thiab SiC Substrate ntau lawm, qhov uas nws muab lub hauv paus ruaj khov, txhim khu kev qha rau kev tso tawm ntawm cov txheej txheem nquag. Lub substrate ua lub luag haujlwm tseem ceeb hauv kev tsim SOI Wafers (Silicon On Insulator), uas yog qhov tseem ceeb rau kev siv tshuab microelectronics thiab kev sib xyaw ua ke. Tsis tas li ntawd, Epi-wafers (epitaxial wafers) ua rau Si Substrates yog ib qho tseem ceeb hauv kev tsim cov khoom siv hluav taws xob zoo xws li lub zog transistors, diodes, thiab kev sib xyaw ua ke.
Lub Si Substrate kuj txhawb kev tsim cov cuab yeej siv Gallium Oxide (Ga2O3), cov khoom cog lus dav dav siv rau kev siv hluav taws xob siab hauv hluav taws xob hluav taws xob. Tsis tas li ntawd, kev sib raug zoo ntawm Semicera's Si Substrate nrog AlN Wafers thiab lwm cov substrate siab ua kom ntseeg tau tias nws tuaj yeem ua tau raws li cov kev cai sib txawv ntawm kev lag luam high-tech, ua rau nws yog ib qho kev daws teeb meem zoo tshaj plaws rau kev tsim cov cuab yeej txiav hauv kev sib txuas lus, tsheb, thiab kev lag luam. .
Txhim khu kev qha thiab zoo ib yam rau High-Tech daim ntaub ntawv
Lub Si Substrate los ntawm Semicera yog ua tib zoo tsim kom tau raws li cov kev xav tau nruj ntawm kev tsim khoom semiconductor. Nws qhov tshwj xeeb ntawm cov qauv kev ntseeg siab thiab cov khoom zoo saum npoo ua rau nws yog cov khoom siv zoo tshaj plaws rau kev siv hauv cov tshuab cassette rau wafer thauj, nrog rau tsim cov txheej txheem siab hauv cov khoom siv semiconductor. Lub substrate muaj peev xwm tswj tau qhov zoo ib yam nyob rau hauv cov txheej txheem sib txawv ua kom muaj qhov tsis xws luag, txhim kho cov txiaj ntsig thiab kev ua tau zoo ntawm cov khoom kawg.
Nrog nws cov thermal conductivity zoo dua, txhua yam muaj zog, thiab siab purity, Semicera's Si Substrate yog cov khoom xaiv rau cov tuam txhab nrhiav kom ua tiav cov qauv siab tshaj plaws ntawm precision, kev ntseeg siab, thiab kev ua haujlwm hauv semiconductor ntau lawm.
Xaiv Semicera's Si Substrate rau High-Purity, High-Performance Solutions
Rau cov tuam txhab lag luam hauv kev lag luam semiconductor, Si Substrate los ntawm Semicera muab cov kev daws teeb meem zoo tshaj plaws rau ntau yam kev siv, los ntawm Si Wafer ntau lawm mus rau kev tsim Epi-Wafers thiab SOI Wafers. Nrog unmatched purity, precision, thiab kev cia siab rau, qhov no substrate enables zus tau tej cov semiconductor li, kom ntseeg tau ntev kev ua tau zoo thiab kev ua tau zoo. Xaiv Semicera rau koj cov kev xav tau ntawm Si substrate, thiab tso siab rau cov khoom tsim los ua kom tau raws li qhov xav tau ntawm tag kis cov thev naus laus zis.
Cov khoom | Ntau lawm | Kev tshawb fawb | Dummy |
Crystal Parameters | |||
Polytype | 4H | ||
Deg orientation yuam kev | 11-20 > 4 ± 0.15 ° | ||
Hluav taws xob Parameters | |||
Dopant | n-hom Nitrogen | ||
Kev tiv thaiv | 0.015-0.025ohm · cm | ||
Mechanical Parameters | |||
Txoj kab uas hla | 150.0 ± 0.2 hli | ||
Thickness | 350 ± 25 hli | ||
Thawj qhov chaw tiaj tiaj | [1-100] ± 5° | ||
Thawj lub tiaj tiaj ntev | 47.5 ± 1.5 hli | ||
Secondary flat | Tsis muaj | ||
TTV | ≤ 5 hli | ≤10 hli | ≤ 15 hli |
LTV | ≤ 3 μm (5mm * 5mm) | ≤ 5 μm (5mm * 5mm) | ≤ 10 μm (5mm * 5mm) |
Hneev | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤ 35 hli | ≤ 45 hli | ≤ 55 hli |
Pem hauv ntej (Si-face) roughness (AFM) | Ra≤0.2nm (5μm * 5μm) | ||
Qauv | |||
Micropipe ceev | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Hlau impurities | ≤5E10 atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
Pem hauv ntej zoo | |||
Pem hauv ntej | Si | ||
Nto tiav | Lub ntsej muag CMP | ||
Cov khoom | ≤60ea / wafer (qhov loj ≥0.3μm) | NA | |
Kos | ≤5ea / hli Kev sib sau ntev ≤ Diameter | Qhov ntev ≤2 * Txoj kab uas hla | NA |
Txiv kab ntxwv tev / pits / stains / striations / tawg / paug | Tsis muaj | NA | |
Ntug chips / indents / tawg / hex daim hlau | Tsis muaj | ||
Polytype cheeb tsam | Tsis muaj | Thaj tsam ≤ 20% | Thaj tsam ≤ 30% |
Pem hauv ntej laser npav | Tsis muaj | ||
Back Quality | |||
Rov qab ua tiav | C-ntsej muag CMP | ||
Kos | ≤5ea/mm, Qhov ntev ≤2 * Txoj kab uas hla | NA | |
Back defects (ntug chips / indents) | Tsis muaj | ||
Rov qab roughness | Ra≤0.2nm (5μm * 5μm) | ||
Rov qab laser npav | 1mm (los ntawm sab saum toj ntug) | ||
Ntug | |||
Ntug | Chamfer | ||
Ntim | |||
Ntim | Epi-npaj nrog lub tshuab nqus tsev ntim Multi-wafer cassette ntim | ||
* Lus Cim: "NA" txhais tau tias tsis muaj kev thov Cov khoom tsis tau hais txog yuav xa mus rau SEMI-STD. |