Semicera's Silicon Nitride Ceramic Substrate sawv cev rau qhov kawg ntawm cov khoom siv thev naus laus zis, muab qhov tshwj xeeb thermal conductivity thiab muaj zog txhua yam khoom. Engineered rau kev ua haujlwm siab, cov substrate no ua tau zoo nyob rau hauv ib puag ncig uas xav tau kev tswj xyuas thermal txhim khu kev qha thiab kev ua haujlwm zoo.
Peb cov Silicon Nitride Ceramic Substrates yog tsim los tiv taus qhov kub thiab txias, ua rau lawv zoo tagnrho rau cov khoom siv hluav taws xob muaj zog thiab muaj zog. Lawv cov thermal conductivity zoo dua ua kom cov cua sov ua kom zoo, uas yog qhov tseem ceeb rau kev tswj xyuas kev ua haujlwm thiab kev ua haujlwm ntev ntawm cov khoom siv hluav taws xob.
Semicera kev cog lus rau kev ua tau zoo yog pom tseeb hauv txhua qhov Silicon Nitride Ceramic Substrate peb tsim. Txhua lub substrate yog tsim los siv cov txheej txheem hauv lub xeev kom ntseeg tau tias muaj kev ua tau zoo thiab muaj qhov tsis xws luag. Cov qib siab ntawm qhov tseeb no txhawb nqa cov kev xav tau nruj ntawm kev lag luam xws li tsheb, aerospace, thiab kev sib txuas lus.
Ntxiv rau lawv cov txiaj ntsig thermal thiab mechanical, peb cov substrates muaj cov khoom siv hluav taws xob zoo heev, uas ua rau muaj kev ntseeg siab ntawm koj cov khoom siv hluav taws xob. Los ntawm kev txo cov hluav taws xob cuam tshuam thiab txhim kho cov khoom ruaj khov, Semicera's Silicon Nitride Ceramic Substrates ua lub luag haujlwm tseem ceeb hauv kev ua kom zoo ntawm cov cuab yeej ua haujlwm.
Xaiv Semicera's Silicon Nitride Ceramic Substrate txhais tau tias kev nqis peev hauv cov khoom lag luam uas muab kev ua haujlwm siab thiab ua haujlwm ntev. Peb cov substrates tau tsim los ua kom tau raws li cov kev xav tau ntawm cov ntawv thov hluav taws xob siab heev, kom ntseeg tau tias koj cov khoom siv tau txais txiaj ntsig los ntawm cov khoom siv thev naus laus zis thiab kev ntseeg tau tshwj xeeb.
| Cov khoom | Ntau lawm | Kev tshawb fawb | Dummy |
| Crystal Parameters | |||
| Polytype | 4H | ||
| Deg orientation yuam kev | 11-20 > 4 ± 0.15 ° | ||
| Hluav taws xob Parameters | |||
| Dopant | n-hom Nitrogen | ||
| Kev tiv thaiv | 0.015-0.025ohm · cm | ||
| Mechanical Parameters | |||
| Txoj kab uas hla | 150.0 ± 0.2 hli | ||
| Thickness | 350 ± 25 hli | ||
| Lub hauv paus tiaj tus taw qhia | [1-100] ± 5° | ||
| Thawj lub tiaj tiaj ntev | 47.5 ± 1.5 hli | ||
| Secondary flat | Tsis muaj | ||
| TTV | ≤ 5 hli | ≤10 hli | ≤ 15 hli |
| LTV | ≤ 3 μm (5mm * 5mm) | ≤ 5 μm (5mm * 5mm) | ≤ 10 μm (5mm * 5mm) |
| Hneev | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| Warp | ≤ 35 hli | ≤ 45 hli | ≤ 55 hli |
| Pem hauv ntej (Si-face) roughness (AFM) | Ra≤0.2nm (5μm * 5μm) | ||
| Qauv | |||
| Micropipe ceev | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
| Hlau impurities | ≤5E10 atoms/cm2 | NA | |
| BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
| TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
| Pem hauv ntej zoo | |||
| Pem hauv ntej | Si | ||
| Nto tiav | Lub ntsej muag CMP | ||
| Cov khoom | ≤60ea / wafer (qhov loj ≥0.3μm) | NA | |
| Kos | ≤5ea / hli Kev sib sau ntev ≤ Diameter | Qhov ntev ≤2 * Txoj kab uas hla | NA |
| Txiv kab ntxwv tev / pits / stains / striations / tawg / paug | Tsis muaj | NA | |
| Ntug chips / indents / tawg / hex daim hlau | Tsis muaj | ||
| Polytype cheeb tsam | Tsis muaj | Thaj tsam ≤ 20% | Thaj tsam ≤ 30% |
| Pem hauv ntej laser npav | Tsis muaj | ||
| Back Quality | |||
| Rov qab ua tiav | C-ntsej muag CMP | ||
| Kos | ≤5ea/mm, Qhov ntev ≤2 * Txoj kab uas hla | NA | |
| Back defects (ntug chips / indents) | Tsis muaj | ||
| Rov qab roughness | Ra≤0.2nm (5μm * 5μm) | ||
| Rov qab laser npav | 1mm (los ntawm sab saum toj ntug) | ||
| Ntug | |||
| Ntug | Chamfer | ||
| Ntim | |||
| Ntim | Epi-npaj nrog lub tshuab nqus tsev ntim Multi-wafer cassette ntim | ||
| * Lus Cim: "NA" txhais tau tias tsis muaj kev thov Cov khoom tsis tau hais txog yuav xa mus rau SEMI-STD. | |||
