Semicera's Silicon On Insulator (SOI) Wafer yog nyob rau hauv pem hauv ntej ntawm semiconductor innovation, muab kev txhim kho hluav taws xob cais thiab kev ua haujlwm zoo dua thermal. Cov qauv SOI, muaj cov txheej txheej silicon nyias ntawm cov txheej txheem insulating, muab cov txiaj ntsig tseem ceeb rau cov khoom siv hluav taws xob ua haujlwm siab.
Peb SOI wafers yog tsim los txo cov kab mob parasitic capacitance thiab cov xau tam sim no, uas yog qhov tseem ceeb rau kev tsim hluav taws xob sib txuas hluav taws xob thiab hluav taws xob tsawg. Qhov kev siv thev naus laus zis no ua kom cov cuab yeej ua haujlwm tau zoo dua, nrog kev txhim kho kev ceev thiab txo kev siv hluav taws xob, tseem ceeb heev rau cov khoom siv hluav taws xob niaj hnub no.
Cov txheej txheem tsim khoom siab heev ua haujlwm los ntawm Semicera lav qhov tsim ntawm SOI wafers nrog zoo sib xws thiab sib xws. Qhov kev ua tau zoo no yog qhov tseem ceeb rau kev siv hauv kev sib txuas lus, tsheb, thiab cov khoom siv hluav taws xob, uas yuav tsum muaj cov khoom siv tau zoo thiab ua tau zoo.
Ntxiv nrog rau lawv cov txiaj ntsig hluav taws xob, Semicera's SOI wafers muab cov thermal rwb thaiv tsev zoo dua, ua kom cov cua sov dissipation thiab ruaj khov nyob rau hauv high-density thiab high-power devices. Qhov no feature yog tshwj xeeb tshaj yog muaj nqis nyob rau hauv daim ntawv thov uas muaj feem xyuam rau lub tshav kub tseem ceeb thiab yuav tsum tau zoo thermal tswj.
Los ntawm kev xaiv Semicera's Silicon On Insulator Wafer, koj nqis peev hauv cov khoom lag luam uas txhawb nqa kev nce qib ntawm cov thev naus laus zis. Peb qhov kev cog lus rau kev ua tau zoo thiab kev tsim kho tshiab ua kom peb cov SOI wafers ua tau raws li qhov xav tau nruj ntawm kev lag luam semiconductor niaj hnub no, muab lub hauv paus rau cov khoom siv hluav taws xob txuas ntxiv mus.
| Cov khoom | Ntau lawm | Kev tshawb fawb | Dummy |
| Crystal Parameters | |||
| Polytype | 4H | ||
| Deg orientation yuam kev | 11-20 > 4 ± 0.15 ° | ||
| Hluav taws xob Parameters | |||
| Dopant | n-hom Nitrogen | ||
| Kev tiv thaiv | 0.015-0.025ohm · cm | ||
| Mechanical Parameters | |||
| Txoj kab uas hla | 150.0 ± 0.2 hli | ||
| Thickness | 350 ± 25 hli | ||
| Lub hauv paus tiaj tus taw qhia | [1-100] ± 5° | ||
| Thawj lub tiaj tiaj ntev | 47.5 ± 1.5 hli | ||
| Secondary flat | Tsis muaj | ||
| TTV | ≤ 5 hli | ≤10 hli | ≤ 15 hli |
| LTV | ≤ 3 μm (5mm * 5mm) | ≤ 5 μm (5mm * 5mm) | ≤ 10 μm (5mm * 5mm) |
| Hneev | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| Warp | ≤ 35 hli | ≤ 45 hli | ≤ 55 hli |
| Pem hauv ntej (Si-face) roughness (AFM) | Ra≤0.2nm (5μm * 5μm) | ||
| Qauv | |||
| Micropipe ceev | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
| Hlau impurities | ≤5E10 atoms/cm2 | NA | |
| BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
| TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
| Pem hauv ntej zoo | |||
| Pem hauv ntej | Si | ||
| Nto tiav | Lub ntsej muag CMP | ||
| Cov khoom | ≤60ea / wafer (qhov loj ≥0.3μm) | NA | |
| Kos | ≤5ea / hli Kev sib sau ntev ≤ Diameter | Qhov ntev ≤2 * Txoj kab uas hla | NA |
| Txiv kab ntxwv tev / pits / stains / striations / tawg / paug | Tsis muaj | NA | |
| Ntug chips / indents / tawg / hex daim hlau | Tsis muaj | ||
| Polytype cheeb tsam | Tsis muaj | Thaj tsam ≤ 20% | Thaj tsam ≤ 30% |
| Pem hauv ntej laser npav | Tsis muaj | ||
| Back Quality | |||
| Rov qab ua tiav | C-ntsej muag CMP | ||
| Kos | ≤5ea/mm, Qhov ntev ≤2 * Txoj kab uas hla | NA | |
| Back defects (ntug chips / indents) | Tsis muaj | ||
| Rov qab roughness | Ra≤0.2nm (5μm * 5μm) | ||
| Rov qab laser npav | 1mm (los ntawm sab saum toj ntug) | ||
| Ntug | |||
| Ntug | Chamfer | ||
| Ntim | |||
| Ntim | Epi-npaj nrog lub tshuab nqus tsev ntim Multi-wafer cassette ntim | ||
| * Lus Cim: "NA" txhais tau tias tsis muaj kev thov Cov khoom tsis tau hais txog yuav xa mus rau SEMI-STD. | |||
