Semicera Silicon Wafers tau ua tib zoo tsim los ua lub hauv paus rau ntau cov khoom siv semiconductor, los ntawm microprocessors mus rau photovoltaic hlwb. Cov wafers no yog engineered nrog high precision thiab purity, kom ntseeg tau tias kev ua tau zoo nyob rau hauv ntau yam khoom siv hluav taws xob.
Tsim los ntawm kev siv cov txheej txheem siab heev, Semicera Silicon Wafers nthuav tawm tshwj xeeb flatness thiab uniformity, uas yog qhov tseem ceeb rau kev ua tiav cov txiaj ntsig siab hauv semiconductor fabrication. Qib no ntawm precision pab txo qhov tsis xws luag thiab txhim kho tag nrho cov kev ua tau zoo ntawm cov khoom siv hluav taws xob.
Qhov zoo tshaj ntawm Semicera Silicon Wafers yog tshwm sim nyob rau hauv lawv cov yam ntxwv hluav taws xob, uas pab txhawb kev ua tau zoo ntawm cov khoom siv semiconductor. Nrog qis impurity theem thiab siab siv lead ua zoo, cov wafers muab lub platform zoo tshaj plaws rau kev tsim cov khoom siv hluav taws xob zoo.
Muaj nyob rau hauv ntau qhov ntau thiab tsawg thiab cov kev qhia tshwj xeeb, Semicera Silicon Wafers tuaj yeem tsim kho kom tau raws li cov kev xav tau tshwj xeeb ntawm kev lag luam sib txawv, suav nrog kev suav, kev sib txuas lus, thiab lub zog tauj dua tshiab. Txawm hais tias rau kev tsim khoom loj lossis kev tshawb fawb tshwj xeeb, cov wafers no xa cov txiaj ntsig zoo.
Semicera tau cog lus los txhawb txoj kev loj hlob thiab kev tsim kho tshiab ntawm kev lag luam semiconductor los ntawm kev muab cov khoom zoo silicon wafers uas ua tau raws li cov qauv kev lag luam siab tshaj plaws. Nrog rau kev tsom mus rau qhov tseeb thiab kev ntseeg siab, Semicera ua rau cov tuam txhab lag luam thawb cov ciam teb ntawm kev siv tshuab, ua kom lawv cov khoom nyob rau hauv lub forefront ntawm kev ua lag luam.
| Cov khoom | Ntau lawm | Kev tshawb fawb | Dummy |
| Crystal Parameters | |||
| Polytype | 4H | ||
| Deg orientation yuam kev | 11-20 > 4 ± 0.15 ° | ||
| Hluav taws xob Parameters | |||
| Dopant | n-hom Nitrogen | ||
| Kev tiv thaiv | 0.015-0.025ohm · cm | ||
| Mechanical Parameters | |||
| Txoj kab uas hla | 150.0 ± 0.2 hli | ||
| Thickness | 350 ± 25 hli | ||
| Thawj qhov chaw tiaj tiaj | [1-100] ± 5° | ||
| Thawj lub tiaj tiaj ntev | 47.5 ± 1.5 hli | ||
| Secondary flat | Tsis muaj | ||
| TTV | ≤ 5 hli | ≤10 hli | ≤ 15 hli |
| LTV | ≤ 3 μm (5mm * 5mm) | ≤ 5 μm (5mm * 5mm) | ≤ 10 μm (5mm * 5mm) |
| Hneev | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| Warp | ≤ 35 hli | ≤ 45 hli | ≤ 55 hli |
| Pem hauv ntej (Si-face) roughness (AFM) | Ra≤0.2nm (5μm * 5μm) | ||
| Qauv | |||
| Micropipe ceev | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
| Hlau impurities | ≤5E10 atoms/cm2 | NA | |
| BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
| TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
| Pem hauv ntej zoo | |||
| Pem hauv ntej | Si | ||
| Nto tiav | Lub ntsej muag CMP | ||
| Cov khoom | ≤60ea / wafer (qhov loj ≥0.3μm) | NA | |
| Kos | ≤5ea / hli Kev sib sau ntev ≤ Diameter | Qhov ntev ≤2 * Txoj kab uas hla | NA |
| Txiv kab ntxwv tev / pits / stains / striations / tawg / paug | Tsis muaj | NA | |
| Ntug chips / indents / tawg / hex daim hlau | Tsis muaj | ||
| Polytype cheeb tsam | Tsis muaj | Thaj tsam ≤ 20% | Thaj tsam ≤ 30% |
| Pem hauv ntej laser npav | Tsis muaj | ||
| Back Quality | |||
| Rov qab ua tiav | C-ntsej muag CMP | ||
| Kos | ≤5ea/mm, Qhov ntev ≤2 * Txoj kab uas hla | NA | |
| Back defects (ntug chips / indents) | Tsis muaj | ||
| Rov qab roughness | Ra≤0.2nm (5μm * 5μm) | ||
| Rov qab laser npav | 1mm (los ntawm sab saum toj ntug) | ||
| Ntug | |||
| Ntug | Chamfer | ||
| Ntim | |||
| Ntim | Epi-npaj nrog lub tshuab nqus tsev ntim Multi-wafer cassette ntim | ||
| * Lus Cim: "NA" txhais tau tias tsis muaj kev thov Cov khoom tsis tau hais txog yuav xa mus rau SEMI-STD. | |||
