Semicera's SiN Ceramics Plain Substrates muab cov kev daws teeb meem zoo rau ntau yam kev siv hluav taws xob thiab kev lag luam. Paub txog lawv cov thermal conductivity zoo heev thiab txhua yam muaj zog, cov substrates no ua kom ntseeg tau tias kev lag luam hauv kev xav tau ib puag ncig.
Peb cov SiN (Silicon Nitride) ceramics yog tsim los tswj qhov kub thiab txias siab, ua rau lawv tsim nyog rau cov khoom siv hluav taws xob siab thiab cov khoom siv semiconductor siab heev. Lawv cov kav ntev thiab ua haujlwm rau thermal shock ua rau lawv zoo tagnrho rau kev siv hauv cov ntawv thov uas muaj kev ntseeg siab thiab kev ua haujlwm tseem ceeb.
Semicera cov txheej txheem tsim khoom kom paub meej tias txhua lub substrate ua tau raws li cov qauv zoo. Qhov no ua rau cov substrates nrog cov tuab tuab thiab qhov zoo, uas yog qhov tseem ceeb rau kev ua tiav kev ua haujlwm zoo hauv cov khoom siv hluav taws xob thiab cov tshuab.
Ntxiv rau lawv cov thermal thiab mechanical zoo, SiN Ceramics Plain Substrates muaj cov khoom siv hluav taws xob zoo heev. Qhov no ua kom muaj kev cuam tshuam hluav taws xob tsawg tsawg thiab pab txhawb rau tag nrho kev ruaj ntseg thiab kev ua tau zoo ntawm cov khoom siv hluav taws xob, txhim kho lawv txoj haujlwm ua haujlwm.
Los ntawm kev xaiv Semicera's SiN Ceramics Plain Substrates, koj tab tom xaiv cov khoom lag luam uas sib txuas cov khoom siv qib siab nrog kev tsim khoom sab saum toj. Peb txoj kev cog lus rau kev ua tau zoo thiab kev tsim kho tshiab tau lees paub tias koj tau txais cov khoom siv substrates uas ua tau raws li cov qauv kev lag luam siab tshaj plaws thiab txhawb nqa kev ua tiav ntawm koj cov haujlwm thev naus laus zis.
| Cov khoom | Ntau lawm | Kev tshawb fawb | Dummy |
| Crystal Parameters | |||
| Polytype | 4H | ||
| Deg orientation yuam kev | 11-20 > 4 ± 0.15 ° | ||
| Hluav taws xob Parameters | |||
| Dopant | n-hom Nitrogen | ||
| Kev tiv thaiv | 0.015-0.025ohm · cm | ||
| Mechanical Parameters | |||
| Txoj kab uas hla | 150.0 ± 0.2 hli | ||
| Thickness | 350 ± 25 hli | ||
| Lub hauv paus tiaj tus taw qhia | [1-100] ± 5° | ||
| Thawj lub tiaj tiaj ntev | 47.5 ± 1.5 hli | ||
| Secondary flat | Tsis muaj | ||
| TTV | ≤ 5 hli | ≤10 hli | ≤ 15 hli |
| LTV | ≤ 3 μm (5mm * 5mm) | ≤ 5 μm (5mm * 5mm) | ≤ 10 μm (5mm * 5mm) |
| Hneev | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| Warp | ≤ 35 hli | ≤ 45 hli | ≤ 55 hli |
| Pem hauv ntej (Si-face) roughness (AFM) | Ra≤0.2nm (5μm * 5μm) | ||
| Qauv | |||
| Micropipe ceev | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
| Hlau impurities | ≤5E10 atoms/cm2 | NA | |
| BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
| TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
| Pem hauv ntej zoo | |||
| Pem hauv ntej | Si | ||
| Nto tiav | Lub ntsej muag CMP | ||
| Cov khoom | ≤60ea / wafer (qhov loj ≥0.3μm) | NA | |
| Kos | ≤5ea / hli Kev sib sau ntev ≤ Diameter | Qhov ntev ≤2 * Txoj kab uas hla | NA |
| Txiv kab ntxwv tev / pits / stains / striations / tawg / paug | Tsis muaj | NA | |
| Ntug chips / indents / tawg / hex daim hlau | Tsis muaj | ||
| Polytype cheeb tsam | Tsis muaj | Thaj tsam ≤ 20% | Thaj tsam ≤ 30% |
| Pem hauv ntej laser npav | Tsis muaj | ||
| Back Quality | |||
| Rov qab ua tiav | C-ntsej muag CMP | ||
| Kos | ≤5ea/mm, Qhov ntev ≤2 * Txoj kab uas hla | NA | |
| Back defects (ntug chips / indents) | Tsis muaj | ||
| Rov qab roughness | Ra≤0.2nm (5μm * 5μm) | ||
| Rov qab laser npav | 1mm (los ntawm sab saum toj ntug) | ||
| Ntug | |||
| Ntug | Chamfer | ||
| Ntim | |||
| Ntim | Epi-npaj nrog lub tshuab nqus tsev ntim Multi-wafer cassette ntim | ||
| * Lus Cim: "NA" txhais tau tias tsis muaj kev thov Cov khoom tsis tau hais txog yuav xa mus rau SEMI-STD. | |||
